Enhancement of thin metallic film adhesion following vacuum ultraviolet irradiation

I. V. Mitchell; G. Nyberg; R. G. Elliman

doi:10.1063/1.95144

Enhancement of thin metallic film adhesion following vacuum ultraviolet irradiation

I. V. Mitchell^*, G. Nyberg, R. G. Elliman

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

34 Citations (Scopus)

Abstract

The adhesion of thin metallic films to silicon substrates is shown to improve following irradiation with a flux of either 21.2-eV (He I) 10.2-eV (H Lyman α) photons. The improved adhesion is similar to that found following MeV energy ion irradiation and keV energy electron irradiation, adding support to the view that electronic excitation and/or ionization and precursors to the stronger bonding configuration.

Original language	English
Pages (from-to)	137-139
Number of pages	3
Journal	Applied Physics Letters
Volume	45
Issue number	2
DOIs	https://doi.org/10.1063/1.95144
Publication status	Published - 1984
Externally published	Yes

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10.1063/1.95144

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@article{6643e69139b44c279914856194e874a6,

title = "Enhancement of thin metallic film adhesion following vacuum ultraviolet irradiation",

abstract = "The adhesion of thin metallic films to silicon substrates is shown to improve following irradiation with a flux of either 21.2-eV (He I) 10.2-eV (H Lyman α) photons. The improved adhesion is similar to that found following MeV energy ion irradiation and keV energy electron irradiation, adding support to the view that electronic excitation and/or ionization and precursors to the stronger bonding configuration.",

author = "Mitchell, {I. V.} and G. Nyberg and Elliman, {R. G.}",

year = "1984",

doi = "10.1063/1.95144",

language = "English",

volume = "45",

pages = "137--139",

journal = "Applied Physics Letters",

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publisher = "American Institute of Physics",

number = "2",

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T1 - Enhancement of thin metallic film adhesion following vacuum ultraviolet irradiation

AU - Mitchell, I. V.

AU - Nyberg, G.

AU - Elliman, R. G.

PY - 1984

Y1 - 1984

N2 - The adhesion of thin metallic films to silicon substrates is shown to improve following irradiation with a flux of either 21.2-eV (He I) 10.2-eV (H Lyman α) photons. The improved adhesion is similar to that found following MeV energy ion irradiation and keV energy electron irradiation, adding support to the view that electronic excitation and/or ionization and precursors to the stronger bonding configuration.

AB - The adhesion of thin metallic films to silicon substrates is shown to improve following irradiation with a flux of either 21.2-eV (He I) 10.2-eV (H Lyman α) photons. The improved adhesion is similar to that found following MeV energy ion irradiation and keV energy electron irradiation, adding support to the view that electronic excitation and/or ionization and precursors to the stronger bonding configuration.

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U2 - 10.1063/1.95144

DO - 10.1063/1.95144

M3 - Article

AN - SCOPUS:0021460953

SN - 0003-6951

VL - 45

SP - 137

EP - 139

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 2

ER -

Enhancement of thin metallic film adhesion following vacuum ultraviolet irradiation

Abstract

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