Epitaxy of III-V semiconductor nanowires towards optoelectronic devices

Q. Gao*, H. J. Joyce, S. Paiman, H. H. Tan, Y. Kim, L. M. Smith, H. E. Jackson, J. M. Yarrison-Rice, X. Zhang, J. Zou, C. Jagadish

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    GaAs and InP based nanowires were grown epitaxially on GaAs or InP (111)B substrates by MOCVD via VLS mechanism. In this paper, I will give an overview of nanowire research activities in our group.

    Original languageEnglish
    Title of host publication2009 14th OptoElectronics and Communications Conference, OECC 2009
    DOIs
    Publication statusPublished - 2009
    Event2009 14th OptoElectronics and Communications Conference, OECC 2009 - Hong Kong, China
    Duration: 13 Jul 200917 Jul 2009

    Publication series

    Name2009 14th OptoElectronics and Communications Conference, OECC 2009

    Conference

    Conference2009 14th OptoElectronics and Communications Conference, OECC 2009
    Country/TerritoryChina
    CityHong Kong
    Period13/07/0917/07/09

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