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Epitaxy of III-V semiconductor nanowires towards optoelectronic devices

  • Q. Gao*
  • , H. J. Joyce
  • , S. Paiman
  • , H. H. Tan
  • , Y. Kim
  • , L. M. Smith
  • , H. E. Jackson
  • , J. M. Yarrison-Rice
  • , X. Zhang
  • , J. Zou
  • , C. Jagadish
  • *Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference Paperpeer-review

    Abstract

    GaAs and InP based nanowires were grown epitaxially on GaAs or InP (111)B substrates by MOCVD via VLS mechanism. In this paper, I will give an overview of nanowire research activities in our group.

    Original languageEnglish
    Title of host publication2009 14th OptoElectronics and Communications Conference, OECC 2009
    DOIs
    Publication statusPublished - 2009
    Event2009 14th OptoElectronics and Communications Conference, OECC 2009 - Hong Kong, China
    Duration: 13 Jul 200917 Jul 2009

    Publication series

    Name2009 14th OptoElectronics and Communications Conference, OECC 2009

    Conference

    Conference2009 14th OptoElectronics and Communications Conference, OECC 2009
    Country/TerritoryChina
    CityHong Kong
    Period13/07/0917/07/09

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