Abstract
The formation and structure of Ge nanocrystals produced in silica by ion-implantation and thermal annealing were studied with transmission electron microscopy, Raman spectroscopy and extended X-ray absorption fine structure (EXAFS) spectroscopy. We compare results derived from these complementary techniques, focusing on the use of EXAFS to study the short-range order about Ge atoms. Utilizing this synchrotron-radiation-based analytical method, we show the nanocrystal inter-atomic distance distribution deviates from that of bulk Ge, exhibiting enhanced structural disorder of both Gaussian and non-Gaussian forms in the first, second and third nearest-neighbour shells. The extent of disorder in the nanocrystalline sample is comparable to that of relaxed amorphous material.
| Original language | English |
|---|---|
| Pages (from-to) | 421-426 |
| Number of pages | 6 |
| Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
| Volume | 218 |
| Issue number | 1-4 |
| DOIs | |
| Publication status | Published - Jun 2004 |
| Event | Proceedings of the Twelfth International Conference on Radiation - Gramado, Brazil Duration: 31 Aug 2003 → 5 Sept 2003 |
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