EXAFS measurements of metal-decorated nanocavities in Si

G. de M. Azevedo*, M. C. Ridgway, J. Betlehem, K. M. Yu, C. J. Glover, G. J. Foran

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)

    Abstract

    The metal-decorated nanocavities in Si were discussed using EXAFS measurements. A sample preparation methodology to enable the identification with synchrotron radiation-based analytical techniques, of the gettering sites of metallic impurities on the internal walls of implantation-induced nanocavities in Si substrates was elaborated. The preliminary results for the Cu-Si and Cu-Cu bond lengths on the internal surface of the nanocavities were also presented.

    Original languageEnglish
    Pages (from-to)179-184
    Number of pages6
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume199
    DOIs
    Publication statusPublished - Jan 2003

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