EXAFS study of the structural properties of in and in + C implanted Ge

R. Feng, F. Kremer, D. J. Sprouster, S. Mirzaei, S. Decoster, C. J. Glover, S. A. Medling, S. P. Russo, M. C. Ridgway

    Research output: Contribution to journalConference articlepeer-review

    Abstract

    The structural configurations of In implanted Ge have been studied via x-ray absorption spectroscopy with and without the codoping of C. In the case of In singly implanted Ge, while the In atoms occupy an substitutional site in Ge (InGe4) at low In concentration (≤ 2 at. %), they precipitate into a metallic phase (In metal) and form complexes composed of one vacancy and three Ge atoms (InVGe3) at concentration ≥ 0.6 at. %. This behaviour can be suppressed by the addition of C leading to In-C pairing to form InCGe3 complexes. This cluster enables In atoms to recover a four-fold coordinated structure and has the potential to improve the electrical activation of In atoms in Ge.

    Original languageEnglish
    Article number012102
    JournalJournal of Physics: Conference Series
    Volume712
    Issue number1
    DOIs
    Publication statusPublished - 2016
    Event16th International Conference on X-Ray Absorption Fine Structure, XAFS 2015 - Karlsruhe, Germany
    Duration: 23 Aug 201528 Aug 2015

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