Excellent Passivation of n-Type Silicon Surfaces Enabled by Pulsed-Flow Plasma-Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide

Jimmy Melskens*, Roel J. Theeuwes, Lachlan E. Black, Willem Jan H. Berghuis, Bart Macco, Paula C.P. Bronsveld, W. M.M. Kessels

*Corresponding author for this work

    Research output: Contribution to journal › Article › peer-review

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    Chemical Engineering