External and internal gettering of interstitial iron in silicon for solar cells

Daniel Macdonald*, An Yao Liu, Sieu Pheng Phang

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    15 Citations (Scopus)

    Abstract

    The removal of dissolved iron from the wafer bulk is important for the performance of ptype multicrystalline silicon solar cells. In this paper we review some recent progress in understanding both external and internal gettering of iron. Internal gettering at grain boundaries and dislocations occurs naturally during ingot cooling, and can also be driven further during cell processing, especially by moderate temperature anneals (usually below 700 °C). Internal gettering at intra-grain defects plays key a role during such precipitation annealing. External gettering to phosphorus diffused regions is crucial in reducing the dissolved iron concentration during cell processing, although its effectiveness depends strongly on the diffusion temperature and profile. Gettering of Fe by boron and aluminum diffusions is also found to be very effective under certain conditions.

    Original languageEnglish
    Title of host publicationGettering and Defect Engineering in Semiconductor Technology XV
    PublisherTrans Tech Publications Ltd.
    Pages26-33
    Number of pages8
    ISBN (Print)9783037858240
    DOIs
    Publication statusPublished - 2014
    Event15th Gettering and Defect Engineering in Semiconductor Technology, GADEST 2013 - Oxford, United Kingdom
    Duration: 22 Sept 201327 Sept 2013

    Publication series

    NameSolid State Phenomena
    Volume205-206
    ISSN (Print)1012-0394

    Conference

    Conference15th Gettering and Defect Engineering in Semiconductor Technology, GADEST 2013
    Country/TerritoryUnited Kingdom
    CityOxford
    Period22/09/1327/09/13

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