Fabrication of Ge On Insulator By Ion-Implantation And Dry Oxidation Techniques

T. H. Kim, K. Belay, D. J. Llewellyn, R. Elliman, D. Y. Choi, B. Luther-Davies

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1634-1635
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	18
Issue number	S2
DOIs	https://doi.org/10.1017/S1431927612010021
Publication status	Published - Jul 2012

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title = "Fabrication of Ge On Insulator By Ion-Implantation And Dry Oxidation Techniques",

author = "Kim, {T. H.} and K. Belay and Llewellyn, {D. J.} and R. Elliman and Choi, {D. Y.} and B. Luther-Davies",

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AU - Kim, T. H.

AU - Belay, K.

AU - Llewellyn, D. J.

AU - Elliman, R.

AU - Choi, D. Y.

AU - Luther-Davies, B.

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JF - Microscopy and Microanalysis

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