Fabrication of graphene nanomesh by using an anodic aluminum oxide membrane as a template

Zhiyuan Zeng, Xiao Huang, Zongyou Yin, Hong Li, Yang Chen, Hai Li, Qing Zhang, Jan Ma, Freddy Boey, Hua Zhang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

194 Citations (Scopus)

Abstract

Large-area graphene nanomesh (GNM) is prepared using a new and effective method, in which the O2 plasma treatment is used with an anodic aluminum oxide (AAO) membrane as an etch mask. By varying the pore size and cell wall thickness of the AAO membrane, GNM with tunable pore size and neck width can be prepared. As proof of concept, a field-effect transistor with 15 nm neck width GNM as the conductive channel is fabricated, which exhibits p-type semiconducting behavior.

Original languageEnglish
Pages (from-to)4138-4142
Number of pages5
JournalAdvanced Materials
Volume24
Issue number30
DOIs
Publication statusPublished - 8 Aug 2012
Externally publishedYes

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