FABRICATION OF THICK NARROW ELECTRODES ON CONCENTRATOR SOLAR CELLS.

Narrow electrodes of thickness greater than 15 microns were fabricated on concentrator solar cells by the PMTP (photoresist-metal-thick photoresist) process. This technique provides grid lines of low series resistance while minimizing the active area of silicon covered by electrodes, both advantages which increase the conversion efficiency of concentrator solar cells. In addition, as this technique is a ″liftoff″ technique, it allows the use of composite or alloy metals which normally suffer in the course of chemical etching. Finally, the thick photoresist layer smooths out short range surface roughness and allows this technique to be used equally effectively on polycrystalline, textured or amorphous surfaces.