Forming random-micropores by optimized 2-step metal assisted etching process

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    2 Citations (Scopus)

    Abstract

    We present a reliable and cost effective 2-step metal-assisted-etching (MAE) texturing technique that forms random-micropores. The optical behavior of the random-micropores is systematically studied. We demonstrate that the random-micropore morphology is capable of suppressing front surface reflection more efficiently than not only the conventional acidic texturing but also the widely used random pyramid texture. We demonstrate that the angular reflectance distribution of our random-micropores is intermediate between isotexture and random upright pyramid structures. These results strongly suggest that the random-nanopore texture can outperform isotexture and random upright pyramid morphology when encapsulated. Due to its nano-scale feature size, it can be used for texturing both mono-crystalline (c-si) and multi-crystalline (mc-si) silicon solar cells, as well as non-conventional thin Si solar cells such as SLIVER cells that feature surfaces that cannot easily be textured using established texturing techniques. The uniformity and reproducibility of the morphology have also been verified.

    Original languageEnglish
    Title of host publication39th IEEE Photovoltaic Specialists Conference, PVSC 2013
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages1672-1673
    Number of pages2
    ISBN (Print)9781479932993
    DOIs
    Publication statusPublished - 2013
    Event39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States
    Duration: 16 Jun 201321 Jun 2013

    Publication series

    NameConference Record of the IEEE Photovoltaic Specialists Conference
    ISSN (Print)0160-8371

    Conference

    Conference39th IEEE Photovoltaic Specialists Conference, PVSC 2013
    Country/TerritoryUnited States
    CityTampa, FL
    Period16/06/1321/06/13

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