GeOx and SiOx nanowires grown via the active oxidation of Ge and Si substrates

Avi Shalav*, Gabriel H. Collin, Yi Yang, Taehyun Kim, Robert G. Elliman

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    8 Citations (Scopus)

    Abstract

    In this study, we show that the volatile monoxide species generated during the active oxidation of Ge and Si substrates can be utilized in the presence of Au catalytic nanoparticles to nucleate and grow GeOx and SiO x nanowires. A simple thermodynamic model is developed to ascertain the critical O2 partial pressure as a function of temperature required for the active oxidation of Ge and Si substrates and is experimentally verified. The ideal conditions for uniform nanowire growth across the substrate are shown to be primarily dependent on the O2 partial pressure, the annealing temperature and thicknesses of the surface oxide, and deposited Au. The role of a metastable surface oxide separating the active oxidation and NW nucleation processes is also discussed.

    Original languageEnglish
    Pages (from-to)2240-2246
    Number of pages7
    JournalJournal of Materials Research
    Volume26
    Issue number17
    DOIs
    Publication statusPublished - 28 Aug 2011

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