Gettering and poisoning of silicon wafers by phosphorus diffused layers

D. Macdonald*, A. Cheung, A. Cuevas

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    13 Citations (Scopus)

    Abstract

    The effectiveness of phosphorus gettering, and the possible re-injection of impurities from the gettering layer during subsequent annealing, has been studied through the use of float-zone samples deliberately contaminated with iron. Lifetime measurements reveal that phosphorus gettering, in this case at 880°C, initially removes more than 99% of the iron from the wafer bulk, to levels below 1×1011cm-3. However, upon further annealing at temperatures greater than the gettering temperature, some of the iron is injected back into the wafer. Annealing at 900°C caused a significant amount of this 'poisoning', with 7% of the pregettered iron returning to the bulk, resulting in a final Fe concentration around 5×1011cm-3. At 800°C there was no detectable re-injection of Fe within uncertainty. The results may have implications for optimising industrial metallisation fire-through processes for multicrystalline solar cells, which contain relatively high levels of iron and other metal impurities.

    Original languageEnglish
    Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
    EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
    Pages1336-1339
    Number of pages4
    Publication statusPublished - 2003
    EventProceddings of the 3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
    Duration: 11 May 200318 May 2003

    Publication series

    NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
    VolumeB

    Conference

    ConferenceProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
    Country/TerritoryJapan
    CityOsaka
    Period11/05/0318/05/03

    Fingerprint

    Dive into the research topics of 'Gettering and poisoning of silicon wafers by phosphorus diffused layers'. Together they form a unique fingerprint.

    Cite this