GISAXS studies of structural modifications in ion-beam amorphized Ge

I. D. Desnica-Franković*, P. Dubcek, U. V. Desnica, S. Bernstorff, M. C. Ridgway, C. J. Glover

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    7 Citations (Scopus)

    Abstract

    Grazing incidence small angle scattering of X-rays (GISAXS) was used to analyze structural modifications in implantation-damaged Ge. Samples were implanted by different doses of 74Ge, from 3 × 1012 cm-2 to 3 × 1016 cm-2; at room- or liquid nitrogen-temperature, respectively. We have found that the micro-structure in amorphous Ge, continuously and consistently evolves as a function of ion dose but differs according to the implantation temperature. In RT-samples small vacancy nanoclusters agglomerate in the end-of-range region of implanted layer even before complete amorphization. With higher doses nanoclusters increase and coalesce into nano-voids. For the highest dose, the onset of porosity is confirmed. On the other hand, in LN-implanted samples, the clustering-related signal is much weaker and evolves more slowly.

    Original languageEnglish
    Pages (from-to)114-117
    Number of pages4
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume249
    Issue number1-2 SPEC. ISS.
    DOIs
    Publication statusPublished - Aug 2006

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