Growth and characterization of GaAsN bulk layer and (In)GaAsN quantum-well structures

Q. Gao, H. H. Tan, C. Jagadish, B. Q. Sun, M. Gal, L. Ouyang, J. Zou

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    In this paper, we review our recent results from studies of growth and optical properties of GaAsN bulk epilayers and (In)GaAsN structures by using double crystal X-ray diffraction (DCXRD), photoluminescence (PL) and cross-sectional transmission electron microscopy (XTEM). We discuss the optimal growth conditions for obtaining high crystal quality GaAsN epilayers and (In)GaAsN/GaAs quantum well (QW) structures with high nitrogen composition. A newly designed GaAsN (QW) structure with multiple-InAs monolayers and 1.3 μ InGaAsN quantum well structure are also presented.

    Original languageEnglish
    Title of host publication2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings
    EditorsMichael Gal
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages247-250
    Number of pages4
    ISBN (Electronic)0780375718
    DOIs
    Publication statusPublished - 2002
    EventConference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Sydney, Australia
    Duration: 11 Dec 200213 Dec 2002

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
    Volume2002-January

    Conference

    ConferenceConference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002
    Country/TerritoryAustralia
    CitySydney
    Period11/12/0213/12/02

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