Growth behavior of epitaxial semiconductor axial nanowire heterostructures

J. Zou*, M. Paladugu, Y. N. Guo, X. Zhang, G. J. Auchterlonie, H. J. Joyce, Q. Gao, H. H. Tan, C. Jagadish, Y. Kim

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    In this paper, we demonstrate the key issues of axial nanowire heterostructures, such as, the fundamental criteria for formation and failure of axial nanowire heterostructures via vapor-liquid-solid mechanism and lateral misfit strain relaxation in these structures. We show the failure of axial nanowire heterostructures by growing InAs axially on GaAs nanowires, and the lateral misfit strain relaxation by axial growth of GaSb on GaAs nanowires.

    Original languageEnglish
    Title of host publicationProceedings of the 2008 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD'08
    Pages71-74
    Number of pages4
    DOIs
    Publication statusPublished - 2008
    Event2008 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD'08 - Sydney, NSW, Australia
    Duration: 28 Jul 20081 Aug 2008

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

    Conference

    Conference2008 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD'08
    Country/TerritoryAustralia
    CitySydney, NSW
    Period28/07/081/08/08

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