Growth of GaAs/InAs vertical nanowires on GaAs (111)B by metalorganic chemical vapor deposition

Yong Kim*, H. J. Joyce, Q. Gao, H. H. Tan, C. Jagadish

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    The growth mechanism and properties of GaAs/InAs nanowires prepared by metalorganic chemical vapor deposition are investigated. Vertical InAs nanowires on GaAs (111)B substrates are successfully grown despite the large lattice mismatch (-7.2%). The crystallographic perfection of InAs nanowires is confirmed by hexagonal or triangular cross section. An interesting L-shaping of GaAs/InAs heterostructure nanowire which could be useful for novel device application is observed.

    Original languageEnglish
    Title of host publication18th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS 2005
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages471-472
    Number of pages2
    ISBN (Print)0780392175, 9780780392175
    DOIs
    Publication statusPublished - 2005
    Event18th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS 2005 - Sydney, Australia
    Duration: 22 Oct 200528 Oct 2005

    Publication series

    NameConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
    Volume2005
    ISSN (Print)1092-8081

    Conference

    Conference18th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS 2005
    Country/TerritoryAustralia
    CitySydney
    Period22/10/0528/10/05

    Fingerprint

    Dive into the research topics of 'Growth of GaAs/InAs vertical nanowires on GaAs (111)B by metalorganic chemical vapor deposition'. Together they form a unique fingerprint.

    Cite this