TY - JOUR
T1 - Helicon wave excitation with rotating antenna fields
AU - Miljak, David G.
AU - Chen, Francis F.
PY - 1998/2
Y1 - 1998/2
N2 - By using phased bifilar antennas, helicon waves have been excited by applying fields which rotate either in space or in time, or both simultaneously. The direction of rotation is made to favour either m = +1 or m = -1 waves, where m is the azimuthal mode number, and m is measured directly. Rotation in time is found to be more effective than rotation in space and makes possible a direct comparison of m = ±1 excitation. An m = -1 structure was seen only in the antenna near field, while m = +1 modes propagate far downstream. Up to 2 kW of RF power, density profiles and antenna loading measurements show that m < 0 (left-hand) waves are poorly coupled, and m = +1 (right-hand) waves are necessary for good plasma production. Loading results indicate that antennas also couple to absorption mechanisms unrelated to helicon waves.
AB - By using phased bifilar antennas, helicon waves have been excited by applying fields which rotate either in space or in time, or both simultaneously. The direction of rotation is made to favour either m = +1 or m = -1 waves, where m is the azimuthal mode number, and m is measured directly. Rotation in time is found to be more effective than rotation in space and makes possible a direct comparison of m = ±1 excitation. An m = -1 structure was seen only in the antenna near field, while m = +1 modes propagate far downstream. Up to 2 kW of RF power, density profiles and antenna loading measurements show that m < 0 (left-hand) waves are poorly coupled, and m = +1 (right-hand) waves are necessary for good plasma production. Loading results indicate that antennas also couple to absorption mechanisms unrelated to helicon waves.
UR - http://www.scopus.com/inward/record.url?scp=0031997517&partnerID=8YFLogxK
U2 - 10.1088/0963-0252/7/1/009
DO - 10.1088/0963-0252/7/1/009
M3 - Article
SN - 0963-0252
VL - 7
SP - 61
EP - 74
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
IS - 1
ER -