High-mobility p-type semiconducting two-dimensional β-TeO2

Ali Zavabeti*, Patjaree Aukarasereenont, Hayden Tuohey, Nitu Syed, Azmira Jannat, Aaron Elbourne, Kibret A. Messalea, Bao Yue Zhang, Billy J. Murdoch, James G. Partridge, Matthias Wurdack, Daniel L. Creedon, Joel van Embden, Kourosh Kalantar-Zadeh, Salvy P. Russo, Chris F. McConville*, Torben Daeneke*

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    129 Citations (Scopus)

    Abstract

    Wide-bandgap oxide semiconductors are essential for the development of high-speed and energy-efficient transparent electronics. However, while many high-mobility n-type oxide semiconductors are known, wide-bandgap p-type oxides have carrier mobilities that are one to two orders of magnitude lower due to strong carrier localization near their valence band edge. Here, we report the growth of bilayer beta tellurium dioxide (β-TeO2), which has recently been proposed theoretically as a high-mobility p-type semiconductor, through the surface oxidation of a eutectic mixture of tellurium and selenium. The isolated β-TeO2 nanosheets are transparent and have a direct bandgap of 3.7 eV. Field-effect transistors based on the nanosheets exhibit p-type switching with an on/off ratio exceeding 106 and a field-effect hole mobility of up to 232 cm2 V−1 s−1 at room temperature. A low effective mass of 0.51 was observed for holes, and the carrier mobility reached 6,000 cm2 V−1 s−1 on cooling to −50 °C.

    Original languageEnglish
    Pages (from-to)277-283
    Number of pages7
    JournalNature Electronics
    Volume4
    Issue number4
    DOIs
    Publication statusPublished - Apr 2021

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