Hydrogen incorporation, diffusivity and evolution in bulk ZnO

K. Ip*, M. E. Overberg, Y. W. Heo, D. P. Norton, S. J. Pearton, C. E. Stutz, S. O. Kucheyev, C. Jagadish, J. S. Williams, B. Luo, F. Ren, D. C. Look, J. M. Zavada

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    50 Citations (Scopus)

    Abstract

    Hydrogen is readily incorporated into bulk, single-crystal ZnO during exposure to plasmas at moderate (100-300°C) temperatures. Incorporation depths of >25 μm were obtained in 0.5 h at 300°C, producing a diffusivity of ∼8 × 10-10 cm2/Vs at this temperature. The activation energy for diffusion is 0.17 ± 0.12 eV, indicating an interstitial mechanism. Subsequent annealing at 500-600 °C is sufficient to evolve all of the hydrogen out of the ZnO, at least to the sensitivity of Secondary Ion Mass Spectrometry (< 5 × 1015 cm-3). The thermal stability of hydrogen retention is slightly greater when the hydrogen is incorporated by direct implantation relative to plasma exposure, due to trapping at residual damage.

    Original languageEnglish
    Pages (from-to)2255-2259
    Number of pages5
    JournalSolid-State Electronics
    Volume47
    Issue number12
    DOIs
    Publication statusPublished - Dec 2003

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