III-V compound semiconductor nanowires

S. Paiman*, H. J. Joyce, J. H. Kang, Q. Gao, H. H. Tan, Y. Kim, X. Zhang, J. Zou, C. Jagadish

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    InP and GaAs based nanowires were grown epitaxially on InP or GaAs (111)B substrates by metalorganic chemical vapor deposition via vapor-liquid-solid (VLS) mechanism. In this report, I will give an overview of nanowire research activities in our group. In particular, the effects of growth parameters for InP and GaAs nanowires on the crystal quality have been studied in detail. We demonstrated the ability to obtain defect-free GaAs nanowires and control the crystal structure of InP nanowires, ie, WZ or ZB, by choosing a combination of growth parameters, such as temperature, V/III ratio and nanowire diameter.

    Original languageEnglish
    Title of host publication2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
    Pages155-156
    Number of pages2
    Publication statusPublished - 2009
    Event2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009 - Genoa, Italy
    Duration: 26 Jul 200930 Jul 2009

    Publication series

    Name2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009

    Conference

    Conference2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
    Country/TerritoryItaly
    CityGenoa
    Period26/07/0930/07/09

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