III-V compound semiconductor nanowires

H. J. Joyce, S. Paiman, Q. Gao, H. H. Tan, Y. Kim, L. M. Smith, H. E. Jackson, J. M. Yarrison-Rice, X. Zhang, J. Zou, C. Jagadish*

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    2 Citations (Scopus)

    Abstract

    GaAs and InP based nanowires were grown epitaxially on GaAs or InP (111)B substrates by metalorganic chemical vapor deposition using Au nanoparticles as catalyst. In this talk, I will give an overview of nanowire research activities in our group. Especially, the effects of growth parameters for GaAs and InP nanowires on the crystal quality have been studied in detail. We demonstrated the ability to obtain defect-free GaAs nanowires and control the crystal structure of InP nanowires, ie, WZ or ZB, by choosing a combination of growth parameters, such as temperature, V/III ratio and nanowire diameter.

    Original languageEnglish
    Title of host publication2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
    Pages59-60
    Number of pages2
    DOIs
    Publication statusPublished - 2009
    Event2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009 - Traverse City, MI, United States
    Duration: 2 Jun 20095 Jun 2009

    Publication series

    Name2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009

    Conference

    Conference2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009
    Country/TerritoryUnited States
    CityTraverse City, MI
    Period2/06/095/06/09

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