Skip to main navigation Skip to search Skip to main content

Imaging and modelling the internal gettering of interstitial iron by grain boundaries in multicrystalline silicon

Research output: Chapter in Book/Report/Conference proceedingConference Paperpeer-review

3 Citations (Scopus)

Abstract

In this paper a simple one-dimensional diffusion-capture model is used to effectively characterise the reduction in interstitial Fe concentrations near grain boundaries in multicrystalline silicon by two fitting parameters: the diffusion length of Fe atoms and the gettering velocity at the grain boundary. The measurements are achieved by photoluminescence images taken before and after dissociating FeB pairs in silicon. The measurement artefacts of lateral photon scattering and lateral carrier diffusion are discussed. The method and the model are verified by a multicrystalline silicon wafer annealed at low temperatures which are known to result in diffusion-limited internal gettering of interstitial Fe.

Original languageEnglish
Title of host publicationProgram - 38th IEEE Photovoltaic Specialists Conference, PVSC 2012
Pages248-253
Number of pages6
DOIs
Publication statusPublished - 2012
Event38th IEEE Photovoltaic Specialists Conference, PVSC 2012 - Austin, TX, United States
Duration: 3 Jun 20128 Jun 2012

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Conference

Conference38th IEEE Photovoltaic Specialists Conference, PVSC 2012
Country/TerritoryUnited States
CityAustin, TX
Period3/06/128/06/12

Fingerprint

Dive into the research topics of 'Imaging and modelling the internal gettering of interstitial iron by grain boundaries in multicrystalline silicon'. Together they form a unique fingerprint.

Cite this