Implications of laser-doping parameters and contact opening size on contact resistivity

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    2 Citations (Scopus)

    Abstract

    Advanced silicon solar cells implement complex structures on both front and rear side. Laser processing has been shown to be a versatile and cost-effective technology for such applications. Local silicon doping or contact opening via ablation are two established process steps. In this work, we investigate their influence on the quality of local contacts with a focus on contact resistivity. We determine values for ρ C down to 70 μΩ cm 2 and 30 μΩ cm 2 for phosphorus and boron respectively, on a simple test structure with the help of three-dimensional numerical simulations.

    Original languageEnglish
    Title of host publication2018 IEEE 7th World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - A Joint Conference of 45th IEEE PVSC, 28th PVSEC and 34th EU PVSEC
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages1008-1012
    Number of pages5
    ISBN (Electronic)9781538685297
    DOIs
    Publication statusPublished - 26 Nov 2018
    Event7th IEEE World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - Waikoloa Village, United States
    Duration: 10 Jun 201815 Jun 2018

    Publication series

    Name2018 IEEE 7th World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - A Joint Conference of 45th IEEE PVSC, 28th PVSEC and 34th EU PVSEC

    Conference

    Conference7th IEEE World Conference on Photovoltaic Energy Conversion, WCPEC 2018
    Country/TerritoryUnited States
    CityWaikoloa Village
    Period10/06/1815/06/18

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