Influence of proton implantation and rapid thermal annealing on GaAs/AlGaAs quantum well infrared photodetector

Li Na*, Wei Lu, Ning Li, Xingquan Liu, Xianzhang Yuan, Hongfei Dou, Xuechu Shen, Lan Fu, H. H. Tan, C. Jagadish, M. B. Johnston, M. Gal

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)

    Abstract

    The intermixing technique was used to modify the energy level distribution of GaAs/AlGaAs quantum-wells so as to change the photoelectric characteristics of the photodetector. A large response wavelength shift was achieved by the proton implantation followed by standard annealing procedures (950°C for 30s). The measurement results show that (1) PL and photoresponse spectra are the function of ion dose in the range from 5×1014/cm2 to 2.5×1015/cm2; (2) the peak photoresponse wavelength is tunable between 8.4 μm and 10.2 μm for the infrared; (3) the PL peak for the related material changes from 1.62 eV to 1.645 eV. The influence on responsivity and dark current was analyzed.

    Original languageEnglish
    Pages (from-to)25-28
    Number of pages4
    JournalHongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves
    Volume19
    Issue number1
    Publication statusPublished - Feb 2000

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