Abstract
By using the NDR operation principle of silicon dual base transistor (DUBAT), referring to the features on structure of HBT and MBE material, this paper proposes the design and fabrication of a novel NDRHBT with a cut-off base structure. The parameters and characteristics measured from the fabricated devices demonstrate that the NDRHBT has good NDR characteristics and good device performance. In addition, the NDR effect that occurs in the negative current region and a light radiation have an effect on I-V characteristics. The results of device simulation for COBNDRHBT are in agreement with the measured results.
Original language | English |
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Pages (from-to) | 1783-1788 |
Number of pages | 6 |
Journal | Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors |
Volume | 26 |
Issue number | 9 |
Publication status | Published - Sept 2005 |