InGaP/GaAs negative differential resistance heterojunction bipolar transistor with a new structure

Weilian Guo*, Haitao Qi, Shilin Zhang, Ming Zhong, Huilai Liang, Luhong Mao, Ruiliang Song, Junming Zhou, Wenxin Wang, C. Jagadish, Lan Fu

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    By using the NDR operation principle of silicon dual base transistor (DUBAT), referring to the features on structure of HBT and MBE material, this paper proposes the design and fabrication of a novel NDRHBT with a cut-off base structure. The parameters and characteristics measured from the fabricated devices demonstrate that the NDRHBT has good NDR characteristics and good device performance. In addition, the NDR effect that occurs in the negative current region and a light radiation have an effect on I-V characteristics. The results of device simulation for COBNDRHBT are in agreement with the measured results.

    Original languageEnglish
    Pages (from-to)1783-1788
    Number of pages6
    JournalPan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
    Volume26
    Issue number9
    Publication statusPublished - Sept 2005

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