Interdiffusion in InGaAs quantum dots by ion implantation

P. Lever, H. H. Tan, P. Reece, M. Gal, C. Jagadish

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    Implantation induced interdiffusion of InGaAs quantum dots has been carried out using hydrogen and arsenic ions. Large energy shifts and significant narrowing was seen in the photolurninescence spectra of the implanted and annealed samples. Lower implantation doses were required to create similar energy shifts in quantum dot samples than reported in the quantum well case. The energy shifts and photolurninescence intensities were found to depend on the ions used, as well as the amount of damage created in the samples. Temperature dependent implantations were found to follow the trends reported for quantum wells.

    Original languageEnglish
    Title of host publication2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings
    EditorsMichael Gal
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages515-518
    Number of pages4
    ISBN (Electronic)0780375718
    DOIs
    Publication statusPublished - 2002
    EventConference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Sydney, Australia
    Duration: 11 Dec 200213 Dec 2002

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
    Volume2002-January

    Conference

    ConferenceConference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002
    Country/TerritoryAustralia
    CitySydney
    Period11/12/0213/12/02

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