Investigation of reactive ion etching of dielectrics and Si in CHF 3/O2 or CHF3/Ar for photovoltaic applications

C. Gatzert*, A. W. Blakers, Prakash N.K. Deenapanray, D. Macdonald, F. D. Auret

*Corresponding author for this work

    Research output: Contribution to journal › Article › peer-review

    30 Citations (Scopus)

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