ION BEAM-INDUCED DAMAGING AND DYNAMIC ANNEALING PROCESSES IN SILICON.

K. T. Short*, D. J. Chivers, R. G. Elliman, J. Liu, A. P. Pogany, H. Wagenfeld, J. S. Williams

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

9 Citations (Scopus)
Original languageEnglish
Title of host publicationMaterials Research Society Symposia Proceedings
PublisherNorth Holland
Pages247-252
Number of pages6
ISBN (Print)0444008691
Publication statusPublished - 1984

Publication series

NameMaterials Research Society Symposia Proceedings
Volume27
ISSN (Print)0272-9172

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