TY - JOUR
T1 - Ion track etching of polycarbonate membranes monitored byin situsmall angle X-ray scattering
AU - Kiy, Alexander
AU - Notthoff, Christian
AU - Dutt, Shankar
AU - Grigg, Mark
AU - Hadley, Andrea
AU - Mota-Santiago, Pablo
AU - Kirby, Nigel
AU - Trautmann, Christina
AU - Toimil-Molares, Maria E.
AU - Kluth, Patrick
N1 - Publisher Copyright:
© the Owner Societies 2021.
PY - 2021/7/14
Y1 - 2021/7/14
N2 - In situsmall angle X-ray scattering (SAXS) measurements of ion track etching in polycarbonate foils are used to directly monitor the selective dissolution of ion tracks with high precision, including the early stages of etching. Detailed information about the track etching kinetics and size, shape, and size distribution of an ensemble of nanopores is obtained. Time resolved measurements as a function of temperature and etchant concentration show that the pore radius increases almost linearly with time for all conditions and the etching process can be described by an Arrhenius law. The radial etching shows a power law dependency on the etchant concentration. An increase in the etch rate with increasing temperature or concentration of the etchant reduces the penetration of the etchant into the polymer but does not affect the pore size distribution. Thein situmeasurements provide an estimate for the track etch rate, which is found to be approximately three orders of magnitude higher than the radial etch rate. The measurement methodology enables new experiments studying membrane fabrication and performance in liquid environments.
AB - In situsmall angle X-ray scattering (SAXS) measurements of ion track etching in polycarbonate foils are used to directly monitor the selective dissolution of ion tracks with high precision, including the early stages of etching. Detailed information about the track etching kinetics and size, shape, and size distribution of an ensemble of nanopores is obtained. Time resolved measurements as a function of temperature and etchant concentration show that the pore radius increases almost linearly with time for all conditions and the etching process can be described by an Arrhenius law. The radial etching shows a power law dependency on the etchant concentration. An increase in the etch rate with increasing temperature or concentration of the etchant reduces the penetration of the etchant into the polymer but does not affect the pore size distribution. Thein situmeasurements provide an estimate for the track etch rate, which is found to be approximately three orders of magnitude higher than the radial etch rate. The measurement methodology enables new experiments studying membrane fabrication and performance in liquid environments.
UR - http://www.scopus.com/inward/record.url?scp=85109357444&partnerID=8YFLogxK
U2 - 10.1039/d1cp02063c
DO - 10.1039/d1cp02063c
M3 - Article
SN - 1463-9076
VL - 23
SP - 14231
EP - 14241
JO - Physical Chemistry Chemical Physics
JF - Physical Chemistry Chemical Physics
IS - 26
ER -