Abstract
Existing procedures for measuring Fe concentrations using low-injection SPV diffusion length measurements on 5-15 Ωcm Si were extended to include arbitrary doping, as well as mid- and high-injection lifetime measurements. This allows the use of fast, contactless lifetime techniques for very sensitive measurement of Fe concentrations on any crystalline silicon material. Thus, the extended technique was slightly more complex than the SPV approach, since the prefactor for determining [Fe]total changes with the injection level.
Original language | English |
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Pages (from-to) | 1021-1028 |
Number of pages | 8 |
Journal | Journal of Applied Physics |
Volume | 95 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1 Feb 2004 |
Externally published | Yes |