@inproceedings{221379fd376a46d7ac48e646d8c18e89,
title = "Laser chemical metal deposition for silicon solar cell metallization",
abstract = "This work describes the development of the Laser Chemical Metal Deposition (LCMD) process for silicon solar cell metallisation. The LCMD process can be considered as an advanced and promising method for solar cell metallisation. With LCMD a metal seed layer is created on the surface of a silicon wafer. Subsequently, the seed layer is thickened by a plating process. It is a low temperature metallisation scheme that does not need any additional masking processes. In this work different nickel solutions and laser configurations were analyzed. Variations of laser power, repetition number and scan speed were performed and the resulting contacts were characterized. With the optimized parameters, silicon solar cells with efficiencies up to 17.9 % have been processed and demonstrate the great potential of LCMD.",
keywords = "Antireflection Coating, Aqueous galvanic solutions, Laser processing, Selective Metal Deposition, Silicon solar cell",
author = "N. Wehkamp and A. Fell and J. Bartsch and F. Granek",
year = "2012",
doi = "10.1016/j.egypro.2012.05.007",
language = "English",
isbn = "9781627484305",
series = "Energy Procedia",
publisher = "Elsevier Ltd.",
pages = "47--57",
booktitle = "Proceedings of 3rd Metallization Workshop on Metallization for Crystalline Silicon Solar Cells",
address = "United Kingdom",
note = "3rd Metallization Workshop on Metallization for Crystalline Silicon Solar Cells 2011 ; Conference date: 25-10-2011 Through 26-10-2011",
}