Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids

Saulius Juodkazis, Hiroaki Misawa*, Tomohiro Hashimoto, Eugene G. Gamaly, Barry Luther-Davies

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    130 Citations (Scopus)


    We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.

    Original languageEnglish
    Article number201909
    JournalApplied Physics Letters
    Issue number20
    Publication statusPublished - 15 May 2006


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