Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids

Saulius Juodkazis; Hiroaki Misawa; Tomohiro Hashimoto; Eugene G. Gamaly; Barry Luther-Davies

doi:10.1063/1.2204847

Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids

Saulius Juodkazis
, Hiroaki Misawa^*
, Tomohiro Hashimoto
, Eugene G. Gamaly
, Barry Luther-Davies

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

148 Citations (Scopus)

Abstract

We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.

Original language	English
Article number	201909
Journal	Applied Physics Letters
Volume	88
Issue number	20
DOIs	https://doi.org/10.1063/1.2204847
Publication status	Published - 15 May 2006

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abstract = "We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.",

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AU - Juodkazis, Saulius

AU - Misawa, Hiroaki

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AU - Gamaly, Eugene G.

AU - Luther-Davies, Barry

PY - 2006/5/15

Y1 - 2006/5/15

N2 - We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.

AB - We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.

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Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids

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