Local structure of implanted Pd in Si using PAC

D. A. Brett, R. Dogra*, A. P. Byrne, M. C. Ridgway, J. Bartels, R. Vianden

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)

    Abstract

    TDPAC has been employed to study the local structure of implanted palladium in silicon utilizing 87-75 keV γ-γ cascade of probe nucleus 100Pd. The observed hyperfine parameters revealed the presence of Pd-V defect pair only in highly doped n-type silicon. A dumbbell structure with substitutional palladium and silicon vacancy as nearest neigbor is suggested for this defect.

    Original languageEnglish
    Pages (from-to)299-303
    Number of pages5
    JournalHyperfine Interactions
    Volume158
    Issue number1-4
    DOIs
    Publication statusPublished - Nov 2004

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