@inproceedings{2bc15342e43a4a7a9348885fb9f5cef5,
title = "Low loss, plasma beam assisted reactive magnetron sputtered silicon nitride films for optical applications",
abstract = "CMOS-compatible SiN layers with ultra-low roughness were deposited using plasma beam assisted reactive sputtering. Material losses below 0.1 dB/cm making it a promising deposition method for photonic integrated circuits and multilayer coatings.",
author = "Andreas Frigg and Andreas Boes and Guanghui Ren and Choi, {Duk Yong} and Silvio Gees and Arnan Mitchell",
note = "Publisher Copyright: {\textcopyright} OSA 2019 {\textcopyright} 2019 The Author(s); Optical Interference Coatings, OIC 2019 ; Conference date: 02-06-2019 Through 07-06-2019",
year = "2019",
doi = "10.1364/OIC.2019.ThD.5",
language = "English",
isbn = "9781943580583",
series = "Optics InfoBase Conference Papers",
publisher = "Optica Publishing Group",
booktitle = "Optical Interference Coatings, OIC 2019",
address = "United States",
}