Measurement of latent tracks in amorphous SiO2 using small angle X-ray scattering
- P. Kluth*
- , C. S. Schnohr
- , D. J. Sprouster
- , A. P. Byrne
- , D. J. Cookson
- , M. C. Ridgway
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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