Abstract
An atomic force microscope is employed in a novel method for measuring the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model of the data.
Original language | English |
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Pages (from-to) | 1321-1322 |
Number of pages | 2 |
Journal | Electronics Letters |
Volume | 28 |
Issue number | 14 |
DOIs | |
Publication status | Published - 2 Jul 1992 |