Metal nano-grating optimization for higher responsivity plasmonic-based gaas metal-semiconductor-metal photodetector

Ayman Karar; Chee Leong Tan; Kamal Alameh; Yong Tak Lee; Fouad Karouta

doi:10.1109/JLT.2013.2243108

Metal nano-grating optimization for higher responsivity plasmonic-based gaas metal-semiconductor-metal photodetector

Ayman Karar^*, Chee Leong Tan, Kamal Alameh, Yong Tak Lee, Fouad Karouta

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.

Original language	English
Article number	6420854
Pages (from-to)	1088-1092
Number of pages	5
Journal	Journal of Lightwave Technology
Volume	31
Issue number	7
DOIs	https://doi.org/10.1109/JLT.2013.2243108
Publication status	Published - 2013

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10.1109/JLT.2013.2243108

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title = "Metal nano-grating optimization for higher responsivity plasmonic-based gaas metal-semiconductor-metal photodetector",

abstract = "To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.",

keywords = "FDTD methods, MSM-PD, nanophotonics, sub-wavelength aperture, surface plasmon polaritons",

author = "Ayman Karar and Tan, {Chee Leong} and Kamal Alameh and Lee, {Yong Tak} and Fouad Karouta",

year = "2013",

doi = "10.1109/JLT.2013.2243108",

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journal = "Journal of Lightwave Technology",

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T1 - Metal nano-grating optimization for higher responsivity plasmonic-based gaas metal-semiconductor-metal photodetector

AU - Karar, Ayman

AU - Tan, Chee Leong

AU - Alameh, Kamal

AU - Lee, Yong Tak

AU - Karouta, Fouad

PY - 2013

Y1 - 2013

N2 - To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.

AB - To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.

KW - FDTD methods

KW - MSM-PD

KW - nanophotonics

KW - sub-wavelength aperture

KW - surface plasmon polaritons

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DO - 10.1109/JLT.2013.2243108

M3 - Article

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JO - Journal of Lightwave Technology

JF - Journal of Lightwave Technology

IS - 7

M1 - 6420854

ER -

Metal nano-grating optimization for higher responsivity plasmonic-based gaas metal-semiconductor-metal photodetector

Abstract

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