TY - GEN
T1 - Metal oxide nanowire growth via intermediate hydroxide formation
T2 - 2012 MRS Fall Meeting
AU - Shalav, Avi
AU - Elliman, Robert G.
PY - 2013
Y1 - 2013
N2 - In this study we apply reaction thermodynamics to show that a significant volatile hydroxide vapor partial pressure forms at a metal-oxide interface and is a likely precursor source for nanowire growth. The growth of WO3 and CuO nanowires are used as examples for reactions dependent on only H 2O and O2+H2O, respectively. Optimal temperatures, H2O (and O2) partial pressures for volatile hydroxide formation are calculated and experimentally investigated. We conclude that metal oxide nanowires can be readily grown at relatively low temperatures (close to or less than 500°C) over short anneal times (tens of minutes). The growth of these metal oxide nanowires, with many oxidation states, by this simple thermal technique is readily suited for a range of emergent large surface area nanostructured optical and electrical applications, including sensing, photocatalysis and ultracapacitors.
AB - In this study we apply reaction thermodynamics to show that a significant volatile hydroxide vapor partial pressure forms at a metal-oxide interface and is a likely precursor source for nanowire growth. The growth of WO3 and CuO nanowires are used as examples for reactions dependent on only H 2O and O2+H2O, respectively. Optimal temperatures, H2O (and O2) partial pressures for volatile hydroxide formation are calculated and experimentally investigated. We conclude that metal oxide nanowires can be readily grown at relatively low temperatures (close to or less than 500°C) over short anneal times (tens of minutes). The growth of these metal oxide nanowires, with many oxidation states, by this simple thermal technique is readily suited for a range of emergent large surface area nanostructured optical and electrical applications, including sensing, photocatalysis and ultracapacitors.
UR - http://www.scopus.com/inward/record.url?scp=84889249028&partnerID=8YFLogxK
U2 - 10.1557/opl.2012.1651
DO - 10.1557/opl.2012.1651
M3 - Conference contribution
SN - 9781605114712
T3 - Materials Research Society Symposium Proceedings
SP - 191
EP - 196
BT - Oxide Semiconductors and Thin Films
Y2 - 25 November 2012 through 30 November 2012
ER -