Metal oxide nanowire growth via intermediate hydroxide formation: A thermochemical assessment

Avi Shalav, Robert G. Elliman

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    In this study we apply reaction thermodynamics to show that a significant volatile hydroxide vapor partial pressure forms at a metal-oxide interface and is a likely precursor source for nanowire growth. The growth of WO3 and CuO nanowires are used as examples for reactions dependent on only H 2O and O2+H2O, respectively. Optimal temperatures, H2O (and O2) partial pressures for volatile hydroxide formation are calculated and experimentally investigated. We conclude that metal oxide nanowires can be readily grown at relatively low temperatures (close to or less than 500°C) over short anneal times (tens of minutes). The growth of these metal oxide nanowires, with many oxidation states, by this simple thermal technique is readily suited for a range of emergent large surface area nanostructured optical and electrical applications, including sensing, photocatalysis and ultracapacitors.

    Original languageEnglish
    Title of host publicationOxide Semiconductors and Thin Films
    Pages191-196
    Number of pages6
    DOIs
    Publication statusPublished - 2013
    Event2012 MRS Fall Meeting - Boston, MA, United States
    Duration: 25 Nov 201230 Nov 2012

    Publication series

    NameMaterials Research Society Symposium Proceedings
    Volume1494
    ISSN (Print)0272-9172

    Conference

    Conference2012 MRS Fall Meeting
    Country/TerritoryUnited States
    CityBoston, MA
    Period25/11/1230/11/12

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