Micro-structure analysis of He+ ion implanted KTP by TEM

Yu Jie Ma; Fei Lu; M. C. Ridgway; Chang Dong Ma; Bo Xu

doi:10.1364/OME.5.000986

Micro-structure analysis of He⁺ ion implanted KTP by TEM

Yu Jie Ma, Fei Lu^*, M. C. Ridgway, Chang Dong Ma, Bo Xu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Micro-structure of high dose He-implanted x-cut KTP is investigated. Rutherford backscattering spectroscopy/channeling (RBS/Channeling) and transmission electron microscopy (TEM) are used to examine the structural and lattice damage properties in KTP after 200keV He⁺-implantation and following thermal annealing. Lattice crack, lattice disorder and He-bubble are observed in different implantation regions. The results show that strain induced by implantation is released through non-elastic lattice deformation in KTP. The implications of these observations for KTP thin film fabrication by smart-cut method are discussed.

Original language	English
Pages (from-to)	986-995
Number of pages	10
Journal	Optical Materials Express
Volume	5
Issue number	5
DOIs	https://doi.org/10.1364/OME.5.000986
Publication status	Published - 2015

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10.1364/OME.5.000986

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title = "Micro-structure analysis of He+ ion implanted KTP by TEM",

abstract = "Micro-structure of high dose He-implanted x-cut KTP is investigated. Rutherford backscattering spectroscopy/channeling (RBS/Channeling) and transmission electron microscopy (TEM) are used to examine the structural and lattice damage properties in KTP after 200keV He+-implantation and following thermal annealing. Lattice crack, lattice disorder and He-bubble are observed in different implantation regions. The results show that strain induced by implantation is released through non-elastic lattice deformation in KTP. The implications of these observations for KTP thin film fabrication by smart-cut method are discussed.",

author = "Ma, \{Yu Jie\} and Fei Lu and Ridgway, \{M. C.\} and Ma, \{Chang Dong\} and Bo Xu",

note = "Publisher Copyright: {\textcopyright} 2015 Optical Society of America.",

year = "2015",

doi = "10.1364/OME.5.000986",

language = "English",

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pages = "986--995",

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T1 - Micro-structure analysis of He+ ion implanted KTP by TEM

AU - Ma, Yu Jie

AU - Lu, Fei

AU - Ridgway, M. C.

AU - Ma, Chang Dong

AU - Xu, Bo

PY - 2015

Y1 - 2015

N2 - Micro-structure of high dose He-implanted x-cut KTP is investigated. Rutherford backscattering spectroscopy/channeling (RBS/Channeling) and transmission electron microscopy (TEM) are used to examine the structural and lattice damage properties in KTP after 200keV He+-implantation and following thermal annealing. Lattice crack, lattice disorder and He-bubble are observed in different implantation regions. The results show that strain induced by implantation is released through non-elastic lattice deformation in KTP. The implications of these observations for KTP thin film fabrication by smart-cut method are discussed.

AB - Micro-structure of high dose He-implanted x-cut KTP is investigated. Rutherford backscattering spectroscopy/channeling (RBS/Channeling) and transmission electron microscopy (TEM) are used to examine the structural and lattice damage properties in KTP after 200keV He+-implantation and following thermal annealing. Lattice crack, lattice disorder and He-bubble are observed in different implantation regions. The results show that strain induced by implantation is released through non-elastic lattice deformation in KTP. The implications of these observations for KTP thin film fabrication by smart-cut method are discussed.

UR - https://www.scopus.com/pages/publications/84929380234

U2 - 10.1364/OME.5.000986

DO - 10.1364/OME.5.000986

M3 - Article

SN - 2159-3930

VL - 5

SP - 986

EP - 995

JO - Optical Materials Express

JF - Optical Materials Express

IS - 5

ER -

Micro-structure analysis of He⁺ ion implanted KTP by TEM

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