MOCVD growth of GaAs nanowires using Ga droplets

S. Breuer*, F. Karouta, H. H. Tan, C. Jagadish

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    3 Citations (Scopus)

    Abstract

    We report on growth of GaAs nanowires on Si(111) substrates using Ga droplets by metal-organic chemical vapour deposition (MOCVD). Appropriate growth conditions to achieve stabilization of small Ga droplets as well as Ga-assisted VLS growth of GaAs nanowires were found. This work facilitates comparative studies of crystalline quality and nanowire surfaces as a function of the droplet (catalyst) material.

    Original languageEnglish
    Title of host publication2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012 - Proceedings
    Pages39-40
    Number of pages2
    DOIs
    Publication statusPublished - 2012
    Event2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012 - Melbourne, VIC, Australia
    Duration: 12 Dec 201214 Dec 2012

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

    Conference

    Conference2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012
    Country/TerritoryAustralia
    CityMelbourne, VIC
    Period12/12/1214/12/12

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