Model surfaces produced by atomic layer deposition

Rick B. Walsh*, Shaun C. Howard, Andrew Nelson, William M. Skinner, Guangming Liu, Vincent S.J. Craig

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    12 Citations (Scopus)


    Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films.

    Original languageEnglish
    Pages (from-to)1247-1249
    Number of pages3
    JournalChemistry Letters
    Issue number10
    Publication statusPublished - 2012


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