Model surfaces produced by atomic layer deposition

Rick B. Walsh; Shaun C. Howard; Andrew Nelson; William M. Skinner; Guangming Liu; Vincent S.J. Craig

doi:10.1246/cl.2012.1247

Model surfaces produced by atomic layer deposition

Rick B. Walsh^*, Shaun C. Howard, Andrew Nelson, William M. Skinner, Guangming Liu, Vincent S.J. Craig

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films.

Original language	English
Pages (from-to)	1247-1249
Number of pages	3
Journal	Chemistry Letters
Volume	41
Issue number	10
DOIs	https://doi.org/10.1246/cl.2012.1247
Publication status	Published - 2012

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10.1246/cl.2012.1247

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title = "Model surfaces produced by atomic layer deposition",

abstract = "Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films.",

author = "Walsh, {Rick B.} and Howard, {Shaun C.} and Andrew Nelson and Skinner, {William M.} and Guangming Liu and Craig, {Vincent S.J.}",

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AU - Howard, Shaun C.

AU - Nelson, Andrew

AU - Skinner, William M.

AU - Liu, Guangming

AU - Craig, Vincent S.J.

PY - 2012

Y1 - 2012

N2 - Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films.

AB - Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films.

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U2 - 10.1246/cl.2012.1247

DO - 10.1246/cl.2012.1247

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VL - 41

SP - 1247

EP - 1249

JO - Chemistry Letters

JF - Chemistry Letters

IS - 10

ER -

Model surfaces produced by atomic layer deposition

Abstract

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