Modeling the transitions from capacitive to inductive to wave-sustained rf discharges

M. A. Lieberman*, R. W. Boswell

*Corresponding author for this work

    Research output: Contribution to conferencePaperpeer-review

    33 Citations (Scopus)

    Abstract

    Radio frequency (rf) plasma sources used in the processing of thin films can be divided into three distinct categories: capacitive (E), inductive (H), and wave (W) -sustained (e.g., helicon) discharges. As the excitation power or voltage is increased, transitions from capacitive to inductive to helicon discharges are often observed, in some cases exhibiting hysteresis. A model is developed to determine these transitions based on the electron energy balance in the discharge and the coupling between capacitive, inductive, and helicon electron energy deposition.

    Original languageEnglish
    PagesPr7-145-Pr7-164
    Number of pages19
    DOIs
    Publication statusPublished - 1998
    Event3rd International Workshop Microwave Discharges: Fundamentals and Applications - Abbaye Royale de Fontevraud, Fontevraud - l'Abbaye, France
    Duration: 20 Apr 199725 Apr 1997

    Conference

    Conference3rd International Workshop Microwave Discharges: Fundamentals and Applications
    Country/TerritoryFrance
    CityFontevraud - l'Abbaye
    Period20/04/9725/04/97

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