Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0): A comparison with the water/Ru(0 0 1) system

K. Andersson, A. Gómez, C. Glover, D. Nordlund, H. Öström, T. Schiros, O. Takahashi, H. Ogasawara*, L. G.M. Pettersson, A. Nilsson

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    86 Citations (Scopus)

    Abstract

    An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D2O is observed to occur above 150 K, similar to the H2O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K.

    Original languageEnglish
    Pages (from-to)L183-L189
    Number of pages7
    JournalSurface Science
    Volume585
    Issue number3
    DOIs
    Publication statusPublished - 10 Jul 2005

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