Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0): A comparison with the water/Ru(0 0 1) system

K. Andersson; A. Gómez; C. Glover; D. Nordlund; H. Öström; T. Schiros; O. Takahashi; H. Ogasawara; L. G.M. Pettersson; A. Nilsson

doi:10.1016/j.susc.2005.04.024

Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0): A comparison with the water/Ru(0 0 1) system

K. Andersson
, A. Gómez
, C. Glover
, D. Nordlund
, H. Öström
, T. Schiros
, O. Takahashi
, H. Ogasawara^*
, L. G.M. Pettersson
, A. Nilsson

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

89 Citations (Scopus)

Abstract

An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D₂O is observed to occur above 150 K, similar to the H₂O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K.

Original language	English
Pages (from-to)	L183-L189
Number of pages	7
Journal	Surface Science
Volume	585
Issue number	3
DOIs	https://doi.org/10.1016/j.susc.2005.04.024
Publication status	Published - 10 Jul 2005

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10.1016/j.susc.2005.04.024

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@article{a85c4f2ea5284f8c8de29d95d0246371,

title = "Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0): A comparison with the water/Ru(0 0 1) system",

abstract = "An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D2O is observed to occur above 150 K, similar to the H2O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K.",

keywords = "Copper, Low index single crystal surfaces, Molecule-solid reactions, Radiation damage, Ruthenium, Surface chemical reaction, Synchrotron radiation photoelectron spectroscopy, Water",

author = "K. Andersson and A. G{\'o}mez and C. Glover and D. Nordlund and H. {\"O}str{\"o}m and T. Schiros and O. Takahashi and H. Ogasawara and Pettersson, \{L. G.M.\} and A. Nilsson",

year = "2005",

month = jul,

day = "10",

doi = "10.1016/j.susc.2005.04.024",

language = "English",

volume = "585",

pages = "L183--L189",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "3",

}

TY - JOUR

T1 - Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0)

T2 - A comparison with the water/Ru(0 0 1) system

AU - Andersson, K.

AU - Gómez, A.

AU - Glover, C.

AU - Nordlund, D.

AU - Öström, H.

AU - Schiros, T.

AU - Takahashi, O.

AU - Ogasawara, H.

AU - Pettersson, L. G.M.

AU - Nilsson, A.

PY - 2005/7/10

Y1 - 2005/7/10

N2 - An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D2O is observed to occur above 150 K, similar to the H2O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K.

AB - An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D2O is observed to occur above 150 K, similar to the H2O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K.

KW - Copper

KW - Low index single crystal surfaces

KW - Molecule-solid reactions

KW - Radiation damage

KW - Ruthenium

KW - Surface chemical reaction

KW - Synchrotron radiation photoelectron spectroscopy

KW - Water

UR - https://www.scopus.com/pages/publications/20444424535

U2 - 10.1016/j.susc.2005.04.024

DO - 10.1016/j.susc.2005.04.024

M3 - Article

SN - 0039-6028

VL - 585

SP - L183-L189

JO - Surface Science

JF - Surface Science

IS - 3

ER -

Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0): A comparison with the water/Ru(0 0 1) system

Abstract

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