TY - GEN
T1 - Monolithically integrated multi-section semiconductor laser by selective area quantum well intermixing
AU - Sajewicz, P.
AU - Fu, L.
AU - Tan, H. H.
AU - Vora, K.
AU - Jagadish, C.
PY - 2012
Y1 - 2012
N2 - In this work, we report the use of dielectric capping layer of TiO 2 to selectively suppress thermal interdiffusion of an InGaAs/GaAs quantum well laser structure. Large differential wavelength shift of ∼ 25nm has been obtained across the same wafer between the uncapped and capped regions which is promising for achieving monolithic integration of multi-section semiconductor laser consisting of a gain, a phase and a passive waveguide sections.
AB - In this work, we report the use of dielectric capping layer of TiO 2 to selectively suppress thermal interdiffusion of an InGaAs/GaAs quantum well laser structure. Large differential wavelength shift of ∼ 25nm has been obtained across the same wafer between the uncapped and capped regions which is promising for achieving monolithic integration of multi-section semiconductor laser consisting of a gain, a phase and a passive waveguide sections.
UR - http://www.scopus.com/inward/record.url?scp=84875614884&partnerID=8YFLogxK
U2 - 10.1109/COMMAD.2012.6472398
DO - 10.1109/COMMAD.2012.6472398
M3 - Conference contribution
SN - 9781467330459
T3 - Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
SP - 137
EP - 138
BT - 2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012 - Proceedings
T2 - 2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012
Y2 - 12 December 2012 through 14 December 2012
ER -