Skip to main navigation Skip to search Skip to main content

Monolithically integrated multi-section semiconductor laser by selective area quantum well intermixing

    Research output: Chapter in Book/Report/Conference proceeding › Conference Paper › peer-review

    Abstract

    In this work, we report the use of dielectric capping layer of TiO 2 to selectively suppress thermal interdiffusion of an InGaAs/GaAs quantum well laser structure. Large differential wavelength shift of ∼ 25nm has been obtained across the same wafer between the uncapped and capped regions which is promising for achieving monolithic integration of multi-section semiconductor laser consisting of a gain, a phase and a passive waveguide sections.

    Original languageEnglish
    Title of host publication2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012 - Proceedings
    Pages137-138
    Number of pages2
    DOIs
    Publication statusPublished - 2012
    Event2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012 - Melbourne, VIC, Australia
    Duration: 12 Dec 2012 → 14 Dec 2012

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

    Conference

    Conference2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012
    Country/TerritoryAustralia
    CityMelbourne, VIC
    Period12/12/12 → 14/12/12

    Fingerprint

    Dive into the research topics of 'Monolithically integrated multi-section semiconductor laser by selective area quantum well intermixing'. Together they form a unique fingerprint.

    Cite this