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Morphology and Crystal Quality of InAs QDs Grown by MOVPE Using Different Growth Modes

Zongyou Yin, Xiaohong Tang*, Jixuan Zhang, Sentosa Deny, Jinghua Teng, Anyan Du, Mee Koy Chin

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference Paperpeer-review

Abstract

Morphology and crystal-quality of InAs/In0.53Ga 0.47As/InP quantum dots (QDs) grown by metal-organic vapor phase epitaxy (MOVPE) in N2 ambient using different growth modes have been studied. It is found that the morphology and crystal-quality of InAs QDs are dependant on the growth modes. After optimizing the dots' growth modes, dots' size dispersion and crystal-quality are both improved greatly, resulting in the enhancement factor of ∼ 2.9 in the photoluminescence (PL) peak-intensity from single QD. When the dots are buried, the dot size decrease compared with the free-standing dots due to the soon capping layer deposition during dots' being buried. The thermal activation energy measured is comparable to the valence-band offset in the QD system calculated by 8 kp theory model. This indicates the PL quenching induced by the interface defects is suppressed due to the defect density lowering in the QDs grown by such optimized growth mode.

Original languageEnglish
Title of host publicationSemiconductor Photonics
Subtitle of host publicationNano-Structured Materials and Devices
PublisherTrans Tech Publications
Pages17-19
Number of pages3
ISBN (Print)0878494715, 9780878494712
DOIs
Publication statusPublished - 2008
Externally publishedYes
EventInternational Conference on Materials for Advanced Technologies, ICMAT 2007 - , Singapore
Duration: 1 Jul 20076 Jul 2007

Publication series

NameAdvanced Materials Research
Volume31
ISSN (Print)1022-6680

Conference

ConferenceInternational Conference on Materials for Advanced Technologies, ICMAT 2007
Country/TerritorySingapore
Period1/07/076/07/07

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